Press Release | Amsterdam, 8 June 2012
Foam in Van Loon III, Daniëlle van Ark
12 October 2012 - 21 January 2013
In 2005 and 2009, Museum Van Loon, just opposite Foam
Photography Museum, opened its welcoming rooms to Foam while theirs
were temporarily closed. In the autumn of 2012 Foam again
temporarily closes its doors in order to build a major
retrospective exhibition of the work of Diane Arbus.
The Dutch photographer Danielle van Ark has been invited
by Foam to be inspired by the house of the Van Loon family. The
result is a special exhibition, 'Foam at Van Loon III, Danielle van
Status and origin, transience and mortality are recurrent themes
in the work of Van Ark. Images including the hands of women with
special jewelery reflect these themes along with installation
Danielle van Ark (1974) lives and works in Amsterdam and studied
at the Royal Academy of Art in The Hague. She is resident at the
Academy of Fine Arts 2012-2013. She received several nominations
including Steenbergen Stipend, Construction in View Price and in
2011 the National Portrait Prize.
Ark gained her international reputation with her series, For
Art's Sake (shown at Foam in 2006), in which class difference,
external display and the attitude of the New York art world she
recorded during openings and galleries in the Chelsea
Foam in Van Loon III, Danielle van Ark in on show from October
12, 2012 until January 21, 2013 in Museum Van Loon. Open daily from
11am - 5pm. Closed on Tuesday. Admission: € 8.00
Note to editors: For more information and to
request images, please contact the communications department of
Foam, email foam[at]foam.org or telephone 020 5516500.
Foam is supported by the BankGiroLoterij, De Brauw Blackstone
Westbroek, Delta Lloyd and VandenEnde Foundation.
1017 DS Amsterdam
+ 31 20 5516500